Anneal processing using Hydrogen is a standard process in the semiconductor industry which has been adopted in several other production processes. Thermco has a developed specific hardware for this process because of the safety issues associated with exhausting H2 from a furnace:
- At ratios of 5% or less of H2 in an inert gas such as Nitrogen or Argon there is no risk of explosion
- For ratios of 5 – 20% Thermco provides a low flow burn off system
- For ratios of >20% Thermco offers an high flow anneal system which utilises a flange with an interstitial seal and a bespoke burn off box to burn H2 in the exhaust
Both the low flow and high flow systems are industry proven solutions and can be supplied as retrofit options or specified when ordering new equipment.