Diffusion furnaces – LPCVD, LED, PV

Thermco Systems – Diffusion furnaces for the semiconductor, MEMS, nano, LED and photovoltaic industries

Established in 1962 in Orange County, California, Thermco Systems have over 50 years of experience in the manufacture of leading edge diffusion furnaces and today, Thermco has the largest installed base of horizontal diffusion furnaces in the world.

From our UK headquarters in Sussex, we supply equipment to the traditional semiconductor market and have developed specialised product versions which have been embraced by companies in the MEMS, LED, photovoltaic and nano industries.

Diffusion and LPCVD furnaces

For the semiconductor industry, Thermco offer hardware via their diffusion and LPCVD furnaces (low pressure chemical vapour deposition) and process solutions for all current semiconductor device technologies, including Bipolar, IGBT, MOS, Bi-CMOS, and MOSFET. For our diffusion and LPCVD furnaces, we have characterised all critical atmospheric and CVD processes for technologies down to 0.35 micron. These processes can also be used for non-critical (bulk processing) applications at advanced technology nodes. Standard processes include:

Atmospheric diffusion furnace

  • Wet oxidation
  • Dry oxidation
  • Inert gas anneal (N2, Ar, etc.)
  • Forming gas and H2 anneals
  • N type doping
  • P type doping
  • Low temp cure
  • High temp drive in

LPCVD diffusion furnace

  • Nitride
  • TEOS
  • HTO
  • Flat temp Polysilicon
  • Ramped temp Polysilicon
  • Doped Polysilicon (P and N type)
  • LTO
  • BPSG

Diffusion furnaces for LED

One of the fastest growing areas in the electronic fabrication industry is LED manufacturing technology. Our diffusion furnaces for LED have been designed to meet the specific needs of LED manufacturing, including low temperature anneals, load and unload of substrates in a controlled N2 atmosphere and annealing in an ultra-high vacuum environment.

As many LED process applications have a critical thermal budget and processes are performed at relatively low temperatures, our diffusion furnaces for LED include special low temperature heating chambers and controlled environment wafer loading systems. Typical processes for the diffusion furnaces for LED include:

  • Low temperature anneal with controlled ambient loading
  • Resist cure
  • Standard anneal/alloy process
  • Zinc and N2 doping

Diffusion furnaces for PV

Throughput and process are the drivers of the photovoltaic industry, so Thermco have developed a class-leading, fully automated solution based around its diffusion furnaces for PV to run fully characterised, industry-specific processes including POCL3, BBR3, BCL3, CVD Nitride, wet and dry oxide and H2 anneal for both mono and multi-Silicon.

Alongside our diffusion furnaces for PV, we have built a library of photovoltaic processes based on design of experiment and process knowledge, including recipes for controlled junction depth, anti-reflective coating and passivation. Standard processes include:

  • N type doping with POCL3 for surface and groove
  • P type doping with BBr3 for surface and groove
  • P type doping with B2H6 for surface and groove
  • Silicon Nitride for anti-reflective coating
  • Wet oxidation surface passivation
  • H2 anneal bulk passivation

In addition to the diffusion and LPCVD furnaces, diffusion furnaces for LED and diffusion furnaces for PV, Thermco Systems also offer a full range of service support, installation and modification. We can offer retro-fits and upgrades to many furnaces products as well as supporting the large installed base of Thermco Systems’ furnaces. We can update gas systems, control systems and automation from the simplest R&D furnace to complex production tools.