Chemical Vapour Deposition

Thermco Systems – Industry leader in graphene chemical vapour deposition furnaces and low pressure chemical vapour deposition products

Established in 1962 in Orange County, California, Thermco Systems have over 50 years of experience in the manufacture of leading edge diffusion furnaces and today, Thermco has the largest installed base of horizontal diffusion furnaces in the world.

From our UK headquarters in Sussex, we supply equipment to the traditional semiconductor market and have developed specialised product versions which have been embraced by companies in the MEMS, LED, photovoltaic and nano industries.

For the semiconductor industry, Thermco offer hardware via their graphene chemical vapour deposition furnace and low pressure chemical vapour deposition products (LPCVD) and process solutions for all current semiconductor device technologies, including Bipolar, IGBT, MOS, Bi-CMOS, and MOSFET. For our graphene chemical vapour deposition furnaces and low pressure chemical vapour deposition products, we have characterised all critical CVD processes for technologies down to 0.35 micron. These processes can also be used for non-critical (bulk processing) applications at advanced technology nodes. Standard processes include:

LPCVD diffusion furnace

  • Nitride
  • TEOS
  • HTO
  • Flat temp Polysilicon
  • Ramped temp Polysilicon
  • Doped Polysilicon (P and N type)
  • LTO
  • BPSG

In addition to the graphene chemical vapour deposition furnaces and low pressure chemical vapour deposition products, Thermco Systems also offer a full range of service support, installation and modification. We can offer retro-fits and upgrades to many furnaces products as well as supporting the large installed base of Thermco Systems’ furnaces. We can update gas systems, control systems and automation from the simplest R&D furnace to complex production tools.